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근태 및 연차관리, 업무평가 등 모든 업무를 한 곳에서 손쉽게 관리하세요.
업무 생산성을 높이고 시간을 절약하세요!


조직 맞춤 성과관리,
국내 대표 HR 플랫폼


어떠한 목표관리 방식도 유연하고 쉽게 설정하여
우리 회사에 최적화된 성과관리를 하기 위해 시작되었습니다.


MBO, OKR 동시/개별 적용은 물론,
어떤 산업, 직무든 우리 회사에 꼭 맞는
제도를 맞춤 설정할 수 있어요.

Nanoimprinting Lithography

Nanoimprinting Lithography is a next-generation lithography technology

that allows nano-sized patterns to be easily formed on various substrates without using a photolithography process.

HUNETPLUS has been developing nanoimprinting materials, processes and equipment that can be applied to various industries.

Also HUNETPLUS is leading the way in commercialization 

based on technology in the field of nanoimprinting lithography accumulated for many years.

UHM(Ultra High-resolution Mask) TM

UHM(Ultra High-resolution Mask)TM is a next-generation mask capable of ultra-high resolution (3,000 ppi)

for organic RGB material deposition of AR / VR display. 

UHM(Ultra High-resolution Mask)TM was developed for the realization of AR/VR display for the beginning of the Metaverse market. 

UHMTM is a breakthrough next-generation mask manufacturing technology

that combines organic-inorganic hybrid material technology and photolithography technology. 

It is capable of realizing ultra-high resolution for next-generation display processes such as AR/VR display.

FFM(Fine Film Mask)TM

FFM(Fine Film Mask)TM is a film type mask capable of high resolution (1,000 ppi)

and large-area deposition (6G~8G) used for organic RGB material deposition of OLED display.

FFM(Fine Film Mask)TM was developed to overcome the limitations of the resolution of FMM (Fine Metal Mask) of existing Invar materials.

It is capable of realizing high resolution and cutting-edge technology capable of depositing on substrates up to 6G~8G in size.

Confidence with Reason,

Start with HUNETPLUS.